107065_Laser-Material-Interaction-Fundamentals-of-laser-ablation-and-EUVL-generation draft8.pdf (2.16 MB)
APPLICATIONS OF SHORT AND ULTRASHORT LASER INTERACTION WITH MATTER: FOR ABLATION AND NANOLITHOGRAPHY
The laser is being applied to various industrial applications as well as many research areas since
the first laser built in the 1960s until it became a promising candidate for the technology
development in the modern life. Hence, laser-material interaction continued to draw global
attention. Understanding the mechanism of laser-material interaction at the femto- and nanosecond
scales is crucial for basic research as well as energy, industrial, and defense applications. This
thesis provides a study of the physics involved in laser-target interaction processes. This study
starts with laser energy couples to target materials, then followed by studying of the ejected target
particles, and the evolution of the evolving plasma. Although there are thorough works both
theoretical and experimental which have been conducted over the years, there are still open
questions to be answered. This includes the coupling of laser energy to the target material mainly
in the high laser energy regions, the role of laser pulse duration on the dependence of the energytarget coupling, the charged particles ejection mechanisms, and how the pulse duration and target
material properties affect target evolution.
Understanding of the physics and mechanisms of laser energy coupling to the target material was
then used for developing and optimizing multi-disciplinary applications. In this thesis, the ultrafast
laser was investigated as a promising candidate for nanoparticles generation and thin film
fabrication. Furthermore, laser energy was used to study the erosion of metals under different
ambient conditions of gas and pressure, these conditions provide a simultaneous thermal, charged
particles, and photons irradiation. These conditions are similar to the conditions at which material
is exposed to in real applications such as energy applications using fusion reactors. Coupling both
ultrafast and fast laser pulses was used for extreme ultraviolet (EUV) light generation for advanced
nanolithography for the next-generation computer chips. This laser-produced plasma could provide a solution to one of a problem existing in the current lithography industry which is ion
debris and EUV photon collection system lifetime degradation.
Funding
PIRE: Nuclear Energy Systems and Materials under Extreme Conditions
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Degree Type
- Doctor of Philosophy
Department
- Nuclear Engineering
Campus location
- West Lafayette
Advisor/Supervisor/Committee Chair
Shripad T. RevankarAdditional Committee Member 2
Lefteri H. TsoukalasAdditional Committee Member 3
Mamoru IshiiAdditional Committee Member 4
David S. KoltickUsage metrics
Categories
Keywords
Laser-Material InteractionLaser-Induced PlasmaLaser ablationLaser-Induced ionsIon dynamicsUltrafast laser ablationNanoparticle generationMass abaltionTerawatt laserAmbient conditions effectablation under high pressureNanosecond laser ablationLaser Induced Breakdown SpectroscopyLaserNuclear EngineeringPlasma PhysicsPlasma Physics; Fusion Plasmas; Electrical Discharges