Increasing flexibility of light manipulation is vital for various domains including both biomedical and military applications, where a lack of photon control could become critical. The efforts conducted and projected within this proposal are focused on three major areas: semi-continuous planar thin film photomodification for infrared (IR) filtering, nanosphere core-shell structures for obscurance, and all-dielectric sub-wavelength focal lenses for advanced IR sensing.Through a collaborative effort with the Army Research Office, we advanced the tunability of planar plasmonic filters with cutoff wavelengths in the 10–16μm range with photomodification using a 10.6μm CO2laser. Surface-enhanced molecular absorption in concert with three-dimensional (3D) Au nano-structures with inherent broad absorption in the IR band was a novel approach utilized to create such planar filters.Expanding on these, efforts and the results of the 2-dimensional (2D) semicontinuous Au plasmonic planar filtering, we further advanced our research with 3D Au nano-coreshell structures to enable levitated long-wavelength pass filter obscurants. We exploited the radiative effects of Au nano-structures that mimic conventional apertures or antennas, though these structures are on the nanometer scale and demonstrated the filtering characteristics through flow cell.In parallel with our plasmonic filtering we designed, manufactured and tested low loss dielectric microlenses for IR radiation based on a dielectric metasurface layer by patterning a SI substrate and etching to sub-micron depths. For a proof-of-concept lens demonstration,we chose a fine patterned array of nano-pillars with variable diameters.Merging our plasmonic filtering and dielectric microlens efforts, we created a holographic lenslet by designing and simulating a low loss focusing metasurface lens with engineered nano-scaled features to converge off-axis IR radiation. An array of nano-pillars with varied diameter and fixed height and periodicity was chosen for ease of fabrication with single layer etching